The effect of N+ ion energy on the properties of ion bombarded plasma polymer films


Autoria(s): Rangel, E. C.; da Cruz, N. C.; Tabacniks, M. H.; Lepienski, C. M.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/04/2001

Resumo

This work describes the influence of the ion bombardment on the electrical, optical and mechanical properties of polymer films deposited from radio-frequency plasmas of benzene. Irradiations were conducted using N+ at 5 x 10(19) ions/m(2), varying the ion energy, E-0, from 0 to 150 keV. Film elemental composition was determined by Rutherford backscattering spectroscopy. Electrical resistivity and hardness were obtained by the two-point probe and nanoindentation technique, respectively. Ultraviolet-visible spectroscopy was employed to investigate the optical constants of the samples. Etching rate was determined by exposure of the films to reactive oxygen plasmas. Ion bombardment induced gradual loss of H and increase in C and O concentrations with Eo. As a consequence the electrical, optical and mechanical properties were drastically affected. Interpretation of these results is proposed in terms of chain cross-linking and unsaturation. (C) 2001 Elsevier B.V. B.V. All rights reserved.

Formato

594-598

Identificador

http://dx.doi.org/10.1016/S0168-583X(00)00646-7

Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 175, p. 594-598, 2001.

0168-583X

http://hdl.handle.net/11449/39560

10.1016/S0168-583X(00)00646-7

WOS:000169389100109

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms

Direitos

closedAccess

Palavras-Chave #ion implantation #plasma polymer #electrical resistivity #optical absorption #hardness
Tipo

info:eu-repo/semantics/article