Ferroelectric characteristics of BiFeO3 thin films prepared via a simple chemical solution deposition


Autoria(s): Simoes, A. Z.; Gonzalez, A. H. M.; Cavalcante, L. S.; Riccardi, C. S.; Longo, Elson; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/04/2007

Resumo

BiFeO3 (BFO) thin films were fabricated on Pt(111)/Ti/SiO2/Si substrates by using a polymeric precursor solution under appropriate crystallization conditions. The capacitance dependence on voltage is strongly nonlinear, confirming the ferroelectric properties of the films resulting from the domain switching. The leakage current density increases with annealing temperature. The polarization electric field curves could be obtained in BFO films annealed at 500 degrees C, free of secondary phases. X-ray photoelectron spectroscopy spectra of films annealed at 500 degrees C indicated that the oxidation state of Fe was purely 3+, demonstrating that our films possess stable chemical configurations. (c) 2007 American Institute of Physics.

Formato

6

Identificador

http://dx.doi.org/10.1063/1.2715513

Journal of Applied Physics. Melville: Amer Inst Physics, v. 101, n. 7, 6 p., 2007.

0021-8979

http://hdl.handle.net/11449/38498

10.1063/1.2715513

WOS:000245691000070

WOS000245691000070.pdf

Idioma(s)

eng

Publicador

American Institute of Physics (AIP)

Relação

Journal of Applied Physics

Direitos

closedAccess

Tipo

info:eu-repo/semantics/article