Evaluating the residual stress in PbTiO3 thin films prepared by a polymeric chemical method


Autoria(s): Valim, D.; Souza, A. G.; Freire, PTC; Mendes, J.; Guarany, C. A.; Reis, R. N.; Araujo, E. B.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

07/03/2004

Resumo

We report a study of residual stress in PbTiO3 (PT) thin films prepared on Si substrates by a polymeric chemical method. The E(1TO) frequency was used to evaluate the residual stress through an empirical equation available for bulk PT. We find that the residual stress in PT films increases as the film thickness decreases and conclude that it originates essentially from the contributions of extrinsic and intrinsic factors. Polarized Raman experiments showed that the PT films prepared by a polymeric chemical method are somewhat a-domain (polar axis c parallel to the substrate) oriented.

Formato

744-747

Identificador

http://dx.doi.org/10.1088/0022-3727/37/5/015

Journal of Physics D-applied Physics. Bristol: Iop Publishing Ltd, v. 37, n. 5, p. 744-747, 2004.

0022-3727

http://hdl.handle.net/11449/38266

10.1088/0022-3727/37/5/015

WOS:000220190200017

Idioma(s)

eng

Publicador

Iop Publishing Ltd

Relação

Journal of Physics D: Applied Physics

Direitos

closedAccess

Tipo

info:eu-repo/semantics/article