Deposition and etching of HMDSO/SF6 plasma polymerized thin films.
| Contribuinte(s) |
Universidade Estadual Paulista (UNESP) |
|---|---|
| Data(s) |
20/05/2014
20/05/2014
13/04/1997
|
| Formato |
456-POLY |
| Identificador |
Abstracts of Papers of the American Chemical Society. Washington: Amer Chemical Soc, v. 213, p. 456-POLY, 1997. 0065-7727 http://hdl.handle.net/11449/37920 WOS:A1997WP18703193 |
| Idioma(s) |
eng |
| Publicador |
Amer Chemical Soc |
| Relação |
Abstracts of Papers of the American Chemical Society |
| Direitos |
closedAccess |
| Tipo |
info:eu-repo/semantics/conferenceObject |
