Soft chemical deposition of BiFeO3 multiferroic thin films


Autoria(s): Gonzalez, A. H. M.; Simoes, A. Z.; Cavalcante, L. S.; Longo, Elson; Varela, José Arana; Riccardi, C. S.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

29/01/2007

Resumo

BiFeO3 thin films free of secondary phases were obtained by the soft chemical solution on Pt(111)/Ti/SiO2/Si substrates after annealing at 500 degrees C for 2 h. The film grown in the (100) direction presented a remanent polarization P-r of 31 mu C/cm(2) at room temperature. Electrical measurements using both quasistatic hysteresis and pulsed polarization confirm the existence of ferroelectricity with a switched polarization of 60-70 mu C/cm(2), Delta P=(P-*-P). Low leakage conduction and an out-of-plane piezoelectric (d(3)) coefficient of 40 pm/V were obtained by the improvement of preparation technology.

Formato

3

Identificador

http://dx.doi.org/10.1063/1.2433027

Applied Physics Letters. Melville: Amer Inst Physics, v. 90, n. 5, 3 p., 2007.

0003-6951

http://hdl.handle.net/11449/32231

10.1063/1.2433027

WOS:000243977300068

WOS000243977300068.pdf

Idioma(s)

eng

Publicador

American Institute of Physics (AIP)

Relação

Applied Physics Letters

Direitos

closedAccess

Tipo

info:eu-repo/semantics/article