Effect of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering


Autoria(s): Azevedo, G. D.; da Silva, JHD; Avendano, E.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/08/2005

Resumo

We have utilized infra-red and optical absorption measurements, grazing incidence X-ray diffraction (GIXRD) and extended X-ray absorption fine structure (EXAFS) measurements to investigate the influence of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering. Hydrogenation induces distinct changes in the optical properties, namely shifts in the absorption edges and reduction of the Urbach energy. Such modifications are correlated to a reduction in structural disorder as determined by EXAFS and the increase of crystallinity determined by GIXRD. (c) 2005 Elsevier B.V. All rights reserved.

Formato

329-333

Identificador

http://dx.doi.org/10.1016/j.nimb.2005.06.071

Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 238, n. 1-4, p. 329-333, 2005.

0168-583X

http://hdl.handle.net/11449/31673

10.1016/j.nimb.2005.06.071

WOS:000232390400069

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms

Direitos

closedAccess

Palavras-Chave #EXAFS #gallium arsenide #GaAs #sputtering #hydrogenation
Tipo

info:eu-repo/semantics/article