Ferroelectric characteristics of SrBi4Ti4O15 thin films grown on Pt/Ti/SiO2/Si substrates by the soft chemical method


Autoria(s): Simoes, A. Z.; Ramirez, M. A.; Riccardi, C. S.; Longo, Elson; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/07/2006

Resumo

Ferroelectric SrBi4Ti4O15 thin films were successfully prepared on a Pt(111)/Ti/SiO2/Si(100) substrate for the first time by spin coating, using the polymeric precursor method. X-ray diffraction patterns of the films indicate that they are polycrystalline in nature. Atomic force microscopy (AFM) analyses showed that the surface of these films is smooth, dense and crack-free with low surface roughness (6.4 nm). At room temperature and at a frequency of 1 MHz, the dielectric constant and the dissipation factor were, respectively, 150 and 0.022. The C-V characteristics of perovskite thin film prepared at low temperature show normal ferrolectric behaviour. The remanent polarization and coercive field for the films deposited were 5.4 mu C/cm(2) and 8 5 kV/cm, respectively. All the capacitors showed good polarization fatigue characteristics at least up to 1 x 10(10) bipolar pulse cycles indicating that SrBi4Ti4O15 thin films can be a promising material for use in nonvolatile memories. (c) 2005 Elsevier B.V. All rights reserved.

Formato

2020-2023

Identificador

http://dx.doi.org/10.1016/j.matlet.2005.12.071

Materials Letters. Amsterdam: Elsevier B.V., v. 60, n. 16, p. 2020-2023, 2006.

0167-577X

http://hdl.handle.net/11449/25403

10.1016/j.matlet.2005.12.071

WOS:000237756600020

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Materials Letters

Direitos

closedAccess

Palavras-Chave #thin films #atomic force microscopy #dielectric properties #fatigue
Tipo

info:eu-repo/semantics/article