Potassium niobate thin films prepared through polymeric precursor method


Autoria(s): Simoes, A. Z.; Ries, A.; Riccardi, C. S.; Gonzalez, A. H.; Zaghete, M. A.; Stojanovic, B. D.; Cilense, M.; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/08/2004

Resumo

Thin films of potassium niobate were deposited on (100) Si substrates by the polymeric precursor method (Pechini method). Annealing in static air was performed at 600degrees C for 20 h. The obtained films were characterized by X-ray diffraction and atomic force microscopy (AFM). Electrical characterization of the films pointed to ferroelectricity via hysteresis loop. The dielectric constant, dissipation factor and resistance were measured in frequency region from 10 Hz to 10 MHz. At 1 MHz, the dielectric constant was 158 and the dissipation factor was 0.11. (C) 2004 Elsevier B.V. All rights reserved.

Formato

2537-2540

Identificador

http://dx.doi.org/10.1016/j.matlet.2004.03.025

Materials Letters. Amsterdam: Elsevier B.V., v. 58, n. 20, p. 2537-2540, 2004.

0167-577X

http://hdl.handle.net/11449/25378

10.1016/j.matlet.2004.03.025

WOS:000222200000020

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Materials Letters

Direitos

closedAccess

Palavras-Chave #KNbO3 #dielectric constant #dissipation factor
Tipo

info:eu-repo/semantics/article