Radiative association of C and P, and Si and P atoms


Autoria(s): Andreazza, C. M.; Marinho, E. P.; Singh, P. D.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

26/02/2014

20/05/2014

26/02/2014

20/05/2014

11/11/2006

Resumo

The rate coefficients for the formation of carbon monophosphide (CP) and silicon monophosphide (SiP) by radiative association are estimated for temperatures ranging from 300 to 14 100 K. In this temperature range, the radiative association rate coefficients are found to vary from 1.14 x 10(-18) to 1.62 x 10(-18) cm(3) s(-1) and from 3.73 x 10(-20) to 7.03 x 10(-20) cm(3) s(-1) for CP and SiP, respectively. In both cases, rate coefficients increase slowly with the increase in temperature.

Formato

1653-1656

Identificador

http://dx.doi.org/10.1111/j.1365-2966.2006.10964.x

Monthly Notices of the Royal Astronomical Society. Malden: Wiley-blackwell, v. 372, n. 4, p. 1653-1656, 2006.

0035-8711

http://hdl.handle.net/11449/24847

10.1111/j.1365-2966.2006.10964.x

WOS:000241626100017

Idioma(s)

eng

Publicador

Wiley-Blackwell

Relação

Monthly Notices of the Royal Astronomical Society

Direitos

closedAccess

Palavras-Chave #atomic data #atomic processes #circumstellar matter #ISM : molecules
Tipo

info:eu-repo/semantics/article