Generalized characteristics of photo-elastic birefringence in polymer strip waveguides

This work investigates the material birefringence in a polymer strip waveguide which originates from thermal stress during the fabrication process. The stress is estimated through a comprehensive numerical study based on a realistic finite element model. The characteristics of birefringence are obtained in a generalized form and expressed by an empirical formula, which is applicable to various polymer materials. The developed formula can be employed to specify the photo-elastic birefringence of a polymer strip channel only by knowing the birefringence in its planar film. This will eliminate the necessity of extensive numerical analysis of thermal stress in such polymer waveguides, and accordingly help the management of stress-induced effects efficiently.