Two-step chemical mechanical polishing of sapphire substrate


Autoria(s): Zhang, Zefang; Liu, Weili; Song, Zhitang; Hu, Xiaokai
Data(s)

01/01/2010

Identificador

http://hdl.handle.net/10536/DRO/DU:30052755

Idioma(s)

eng

Publicador

Electrochemical Society

Relação

http://dro.deakin.edu.au/eserv/DU:30052755/hu-twostepchemical-2010.pdf

http://dx.doi.org/10.1149/1.3410116

Palavras-Chave #chemical mechanical polishing #friction #planarisation #sapphire #substrates #surface topography measurement
Tipo

Journal Article