Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application
| Data(s) |
01/11/2010
|
|---|---|
| Identificador | |
| Idioma(s) |
eng |
| Publicador |
Elsevier |
| Relação |
http://dro.deakin.edu.au/eserv/DU:30052753/hu-investigationonthe-2010.pdf http://dx.doi.org/10.1016/j.mee.2009.10.005 |
| Palavras-Chave | #silica #colloidal abrasives #CMP #growth #integrated circuit |
| Tipo |
Journal Article |
