Combined continuous wave and pulsed plasma modes : For more stable interfaces with higher functionality on metal and semiconductor surfaces
Data(s) |
14/10/2009
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Resumo |
A novel approach to producing improved bio-interfaces by combining continuous wave (CW) and pulsed plasma polymerization (PP) modes is reported. This approach has enabled the generation of stable interfaces with a higher density of primary amine functionality on metal, ceramic and semiconductor surfaces. Heptylamine (HA) was used as the amine-precursor. In this new design, a thin CW PPHA layer is introduced to provide strong cross-linking and attachment to the metal or semiconductor surfaces and to provide a good foundation for better bonding a pulsed PPHA layer with high retention of functional groups. The combined mode provides the pulsed mode advantage of a 3-fold higher density of primary amines, while retaining much of the markedly higher stability in aqueous solutions of the continuous mode.<br /> |
Identificador | |
Idioma(s) |
eng |
Publicador |
Wiley – VCH Verlag GmbH & Co. KGaA |
Relação |
http://dro.deakin.edu.au/eserv/DU:30028420/lamb-combinedcontinuous-2009.pdf http://dx.doi.org/10.1002/ppap.200900042 |
Direitos |
2009, WILEY-VCH Verlag GmbH & Co |
Palavras-Chave | #adhesion #bio-interfaces #continuous wave (CW) #pulsed plasma polymerization (PP) #molecular bonding #aqueous solutions |
Tipo |
Journal Article |