Chemical vapor deposition for film deposition

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Autoria(s): Dharmalingam, Sugumar; Kong, Lingxue

Contribuinte(s)	Li, Dongqing
Data(s)	01/01/2008
Identificador	http://hdl.handle.net/10536/DRO/DU:30018866
Idioma(s)	eng
Publicador	Springer
Relação	http://dx.doi.org/10.1007/978-0-387-48998-8_214
Tipo	Book Chapter