The role of HBF(4) in electro-catalysis: Arsenic contamination and anion adsorption


Autoria(s): SANTOS, Adriano L.; NAGAO, Raphael; OLIVEIRA, Cristiane P.; LIMA, Roberto B. de; VARELA, Hamilton
Contribuinte(s)

UNIVERSIDADE DE SÃO PAULO

Data(s)

20/10/2012

20/10/2012

2011

Resumo

We present in this work a comprehensive investigation of the role played by dissolved tetrafluoroboric acid on the electrochemical response of a polycrystalline platinum electrode in acidic media. HBF(4) from two different suppliers was employed and characterized in terms of the amount of arsenic contamination by Inductively Coupled Plasma-Optical Emission Spectroscopy. The effect of different amounts of HBF(4) on the voltammetric profile of the Pt vertical bar HClO(4)(aq) interface was investigated by means of electrochemical quartz crystal nanobalance (EQCN). Despite the comparable cyclic voltammograms, the presence of arsenic in one of the two HBF(4) used resulted in dramatic variations in the mass change profile, which evidences the deposition/dissolution of arsenic prior to the surface oxidation. For the arsenic-free HBF(4), its effect on the mass change profile was mainly associated to anion adsorption. The impact of dissolved HBF(4) on the electro-oxidation of formic acid was rationalized in terms of two contributions: current enhancement at low potentials due to the arsenic-assisted formic acid electro-oxidation and inhibition at high potentials due to anion adsorption. (C) 2011 Elsevier B.V. All rights reserved.

Fundacao de Amparo a Pesquisa do Estado de Sao Paulo (FAPESP)[2007/06037-2]

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Fundacao de Amparo a Pesquisa do Estado de Sao Paulo (FAPESP)[2009/00153-6]

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Fundacao de Amparo a Pesquisa do Estado de Sao Paulo (FAPESP)[2009/16449-1]

Fundacao de Amparo a Pesquisa do Estado de Sao Paulo (FAPESP)[2009/07629-6]

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Conselho Nacional de Desenvolvimento Cientifico e Tecnologico (CNPq)[302698/2007-8]

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Conselho Nacional de Desenvolvimento Cientifico e Tecnologico (CNPq)[306151/2010-3]

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Identificador

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, v.660, n.1, p.147-152, 2011

1572-6657

http://producao.usp.br/handle/BDPI/31870

10.1016/j.jelechem.2011.06.023

http://dx.doi.org/10.1016/j.jelechem.2011.06.023

Idioma(s)

eng

Publicador

ELSEVIER SCIENCE SA

Relação

Journal of Electroanalytical Chemistry

Direitos

restrictedAccess

Copyright ELSEVIER SCIENCE SA

Palavras-Chave #Electro-catalysis #Electrochemical quartz crystal nanobalance #Formic acid #Tetrafluoroboric acid #Anion adsorption #QUARTZ-CRYSTAL NANOBALANCE #FORMIC-ACID #ELECTROCHEMICAL-BEHAVIOR #ELECTROCATALYTIC OXIDATION #PLATINUM-ELECTRODES #REACTION-RATES #SURFACE #METHANOL #INCREASES #ELECTROOXIDATION #Chemistry, Analytical #Electrochemistry
Tipo

article

original article

publishedVersion