Fano resonance in heavily doped porous silicon
Contribuinte(s) |
UNIVERSIDADE DE SÃO PAULO |
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Data(s) |
20/10/2012
20/10/2012
2011
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Resumo |
Unexpectedly, the Fano resonance caused by the interference of continuum electron excitations with the longitudinal optical (LO) phonons was observed in random porous Si by Raman scattering. The analysis of the experimental data shows that the electron states trapped at the Si-SiO(2) interface dominate in the observed Raman scattering. The gap energy associated with the interface states was determined. Copyright (C) 2011 John Wiley & Sons, Ltd. Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) FAPESP CNPq Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) Argentinean CIUNT Argentinean CIUNT CONICET Consejo Nacional de Investigaciones Científicas y Técnicas de Argentina (CONICET) Fondo para la Investigación Científica y Tecnológica (FonCyT) FONCyT |
Identificador |
JOURNAL OF RAMAN SPECTROSCOPY, v.42, n.6, p.1405-1407, 2011 0377-0486 http://producao.usp.br/handle/BDPI/30210 10.1002/jrs.2870 |
Idioma(s) |
eng |
Publicador |
WILEY-BLACKWELL |
Relação |
Journal of Raman Spectroscopy |
Direitos |
restrictedAccess Copyright WILEY-BLACKWELL |
Palavras-Chave | #porous silicon #Raman spectroscopy #RAMAN-SCATTERING #LUMINESCENCE #SI #Spectroscopy |
Tipo |
article original article publishedVersion |