Growth and Characterization of LiCoO₂ Thin Films for Microbatteries


Autoria(s): Hui, Xia; Lu, Li; Ceder, Gerbrand
Data(s)

09/12/2004

09/12/2004

01/01/2005

Resumo

LiCoO₂thin films have been grown by pulsed laser deposition on stainless steel and SiO₂/Si substrates. The film deposited at 600°C in an oxygen partial pressure of 100mTorr shows an excellent crystallinity, stoichiometry and no impurity phase present. Microstructure and surface morphology of thin films were examined using a scanning electron microscope. The electrochemical properties of the thin films were studied with cyclic voltammetry and galvanostatic charge-discharge techniques in the potential range 3.0-4.2 V. The initial discharge capacity of the LiCoO2 thin films deposited on the stainless steel and SiO₂/Si substrates reached 23 and 27 µAh/cm², respectively.

Singapore-MIT Alliance (SMA)

Formato

328820 bytes

application/pdf

Identificador

http://hdl.handle.net/1721.1/7364

Idioma(s)

en

Relação

Advanced Materials for Micro- and Nano-Systems (AMMNS);

Palavras-Chave #LiCoO2 #Pulsed laser deposition #Thin films #Electrochemical properties #SiO2/Si
Tipo

Article