Mechanism of electrical conduction in plasma polymerized furfural thin films


Autoria(s): Joseph, Mathai C; Anantharaman, M R; Venkitachalam, S; Jayalekshmi,S
Data(s)

29/03/2012

29/03/2012

01/09/2002

Resumo

Polyfurfural thin films lying in the thickness range of 1300–2000 A˚ were prepared by ac plasma polymerization technique. The current–voltage characteristics in symmetric and asymmetric electrode configuration were studied with a view to determining the dominant conduction mechanism.It was found that the Schottky conduction mechanism is dominant in plasma polymerized furfural thin films.The predominance of Schottky mechanism was further confirmed based on the thermally stimulated current measurements.

Identificador

0040-6090

Thin Solid Films Volume 416, Issue 1-2, 2 September 2002, Pages 10-15

http://dyuthi.cusat.ac.in/purl/2832

Idioma(s)

en

Publicador

Elsevier

Palavras-Chave #Plasma processing and deposition #Polymers #Conduction mechanism #TSC
Tipo

Working Paper