Effect of self assembly on the nonlinear optical characteristics of ZnO thin films


Autoria(s): Litty, Irimpan; Deepthy, A; Bindu, Krishnan; Kukreja, L M; Nampoori, V P N; Radhakrishnan, P
Data(s)

02/12/2011

02/12/2011

2008

Resumo

In the present work, we report the third order nonlinear optical properties of ZnO thin films deposited using self assembly, sol gel process as well as pulsed laser ablation by z scan technique. ZnO thin films clearly exhibit a negative nonlinear index of refraction at 532 nm and the observed nonlinear refraction is attributed to two photon absorption followed by free carrier absorption. Although the absolute nonlinear values for these films are comparable, there is a change in the sign of the absorptive nonlinearity of the films. The films developed by dip coating and pulsed laser ablation exhibit reverse saturable absorption whereas the self assembled film exhibits saturable absorption. These different nonlinear characteristics in the self assembled films can be mainly attributed to the saturation of linear absorption of the ZnO defect states.

Cochin University of Science and Technology,Centre for Materials for Electronics Technology & Centre for Advanced Technology

Identificador

0030-4018

Optics Communications 281 (2008) 2938–2943

http://dyuthi.cusat.ac.in/purl/2585

http://www.sciencedirect.com/science/article/pii/S0030401808000588

Idioma(s)

en

Publicador

Elsevier

Palavras-Chave #semiconductor materials #semiconductors #Self-assembly #Sol-gel processing #precipitation #Laser deposition #Optical susceptibility #hyperpolarizability #Other nonlinear optical materials #Optical constants
Tipo

Working Paper