Photoacoustic studies on n-type InP


Autoria(s): Nibu, A George; Vallabhan, C P G; Nampoori, V P N; Radhakrishnan, P
Data(s)

29/10/2011

29/10/2011

01/01/2002

Resumo

We discuss an open photoacoustic cell study on sulfer-doped n-type InP wafer. The thermal diffusivity of the sample is evaluated from the phase data associated with the photoacoustic signal as a function of the modulation frequency under heat transmission configuration. Analysis is made on the basis of the Rosencwaig-Gersho theory and the results are compared with those from earlier reported photoacoustic studies of semiconductors. Our investigation clearly indicates that the instantaneous thermalization process is the major heat diffusion mechanism responsible for the photoacoustic signal generation in an InP sample.

Cochin University of Science and Technology

Identificador

Opt. Eng. 41(1) 251–254 (January 2002)

http://dyuthi.cusat.ac.in/purl/2411

doi:10.1117/1.1419023

Idioma(s)

en

Publicador

Society of Photo-Optical Instrumentation Engineers

Palavras-Chave #photoacoustic and photothermal science and engineering #indium phosphide #heat diffusion in semiconductors
Tipo

Working Paper