Filme fino de ZrO2 enxertado sobre a superfície de sílica gel: preparação e propriedade de adsorção de Cr(VI)
Data(s) |
01/05/2002
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Resumo |
The present experiment describes an easy procedure for obtaining SiO2/ZrO2 by reacting ZrOCl2 with SiO2 with the following characteristics: S BET = 500 m² g-1 and an average pore diameter of 6 nm. The material obtained presented 1.3 wt% ZrO2 content corresponding to 140 mumol g-1. The average density of ZrO2 onto SiO2/ZrO2 matrix is 2.8x10-11 mol cm-2. The adsorption isotherm for Cr(VI) showed a maximum of adsorption value (200 mumol g-1) at pH 2. The adsorption can be described by the reaction: =Zr(OH)2 + 2HCrO4- + 2H+ <IMG SRC="http:/img/fbpe/qn/v25n3/9346fr1.gif">[(=Zr(OH2+)2) (HCrO4-)2]. Above the zero point of charge, i.e. pH > 5.5 due to the surface charge inversion, desorption of Cr(VI) occurs according to the reaction: [(=Zr(OH2+)2) (HCrO4-)2] + 6OH- <IMG SRC="http:/img/fbpe/qn/v25n3/9346fr1.gif">(=ZrO2)2- + 6H2O + 2CrO4(2-). |
Formato |
text/html |
Identificador |
http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0100-40422002000300025 |
Idioma(s) |
pt |
Publicador |
Sociedade Brasileira de Química |
Fonte |
Química Nova v.25 n.3 2002 |
Palavras-Chave | #silica gel #zirconium(IV) oxide #chromium(VI) |
Tipo |
journal article |