Growth rate of fractal copper electrodeposits: Potential and concentration effects


Autoria(s): Costa, J. M.; Sagués i Mestre, Francesc; Vilarrasa, M.
Contribuinte(s)

Universitat de Barcelona

Data(s)

04/05/2010

Resumo

Experiments are reported on fractal copper electrodeposits. An electrochemical cell was designed in order to obtain a potentiostatic control on the quasi-two-dimensional electrodeposition process. The aim was focused on the analysis of the growth rate of the electrodeposited phase, in particular its dependence on the electrode potential and electrolyte concentration.

Identificador

http://hdl.handle.net/2445/9522

Idioma(s)

eng

Publicador

The American Physical Society

Direitos

(c) The American Physical Society, 1991

info:eu-repo/semantics/openAccess

Palavras-Chave #Electroquímica #Deposició (Metal·lúrgia) #Electrochemistry #Plating
Tipo

info:eu-repo/semantics/article