Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers


Autoria(s): Batlle Gelabert, Xavier; Hattink, Bart Jan; Labarta, Amílcar; Åkerman, Johan J.; Escudero, Roberto; Schuller, Ivan K.
Contribuinte(s)

Universitat de Barcelona

Data(s)

02/03/2012

Resumo

An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state¿i.e., O:(oxidize)Al ratio¿, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions

Identificador

http://hdl.handle.net/2445/22090

Idioma(s)

eng

Publicador

American Institute of Physics

Direitos

X-ray spectroscopy

(c) American Institute of Physics, 2002

Palavras-Chave #Espectroscòpia de raigs X #Fotoelectrons #Espectroscòpia d'electrons #Materials magnètics #Photoelectrons #Electron spectroscopy #Magnetic materials
Tipo

info:eu-repo/semantics/article