Adsorption of colloidal particles in the presence of external fields


Autoria(s): Pagonabarraga Mora, Ignacio; Bafaluy Bafaluy, Javier; Rubí Capaceti, José Miguel
Contribuinte(s)

Universitat de Barcelona

Data(s)

25/06/2010

Resumo

We present a new class of sequential adsorption models in which the adsorbing particles reach the surface following an inclined direction (shadow models). Capillary electrophoresis, adsorption in the presence of a shear, and adsorption on an inclined substrate are physical manifestations of these models. Numerical simulations are carried out to show how the new adsorption mechanisms are responsible for the formation of more ordered adsorbed layers and have important implications in the kinetics, in particular, modifying the jamming limit.

Identificador

http://hdl.handle.net/2445/13173

Idioma(s)

eng

Publicador

American Physical Society

Direitos

(c) American Physical Society, 1995

info:eu-repo/semantics/openAccess

Palavras-Chave #Química física #Adsorció #Suspensions (Química) #Col·loides #Partícules (Matèria) #Chemistry, Physical and theoretical #Adsorption #Suspensions (Chemistry) #Colloids #Particles
Tipo

info:eu-repo/semantics/article