Influence of mismatch on the defects in relaxed epitaxial InGaAs/GaAs(100) films grown by molecular beam epitaxy
Contribuinte(s) |
Universitat de Barcelona |
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Data(s) |
02/05/2012
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Identificador | |
Idioma(s) |
eng |
Publicador |
American Institute of Physics |
Direitos |
(c) American Institute of Physics, 1993 info:eu-repo/semantics/openAccess |
Palavras-Chave | #Cristal·lografia #Nanotecnologia #Crystallography #Nanotechnology |
Tipo |
info:eu-repo/semantics/article |