Influence of mismatch on the defects in relaxed epitaxial InGaAs/GaAs(100) films grown by molecular beam epitaxy


Autoria(s): Westwood, David I.; Woolf, D. A.; Vilà i Arbonès, Anna Maria; Cornet i Calveras, Albert; Morante i Lleonart, Joan Ramon
Contribuinte(s)

Universitat de Barcelona

Data(s)

02/05/2012

Identificador

http://hdl.handle.net/2445/24722

Idioma(s)

eng

Publicador

American Institute of Physics

Direitos

(c) American Institute of Physics, 1993

info:eu-repo/semantics/openAccess

Palavras-Chave #Cristal·lografia #Nanotecnologia #Crystallography #Nanotechnology
Tipo

info:eu-repo/semantics/article