Nanoscale capacitance microscopy of thin dielectric films


Autoria(s): Gomila Lluch, Gabriel; Toset Gilabert, Jorge; Fumagalli, Laura
Contribuinte(s)

Universitat de Barcelona

Data(s)

08/05/2012

Resumo

We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerical simulations and experimental results on a broad range of values. Based on these results, we discuss the capabilities of nanoscale capacitance microscopy for the quantitative extraction of the dielectric constant and the thickness of thin dielectric films at the nanoscale.

Identificador

http://hdl.handle.net/2445/25086

Idioma(s)

eng

Publicador

American Institute of Physics

Direitos

(c) American Institute of Physics, 2008

info:eu-repo/semantics/openAccess

Palavras-Chave #Dielèctrics #Nanotecnologia #Dielectrics #Nanotechnology
Tipo

info:eu-repo/semantics/article