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Autoria(s): Abraham J.; Kwan P.; Champod C.; Lennard C.; Roux C.; Yang J. (ed.); Xie S. J. (ed.)
Data(s)

01/11/2012

Identificador

http://serval.unil.ch/?id=serval:BIB_4E7371FB2B85

isbn:978-953-51-0859-7

Idioma(s)

en

Publicador

INTECH

Fonte

New Trends and Developments in Biometrics

An AFIS Candidate List Centric Fingerprint Likelihood Ratio Model based on Morphometric and Spatial Analyses (MSA)

Tipo

info:eu-repo/semantics/bookPart

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