Fully transparent ZnO thin-film transistor produced at room temperature


Autoria(s): Fortunato, Elvira; Barquinha, Pedro; Pimentel, A. C. M. B. G.; Gonçalves, A. M. F.; Marques, A. J. S.; Pereira, L. M. N.; Martins, Rodrigo
Data(s)

18/03/2010

18/03/2010

01/03/2005

Resumo

Advanced Materials, Vol. 17, nº 5

Fully transparent thin-film transistors (TFTs) are produced at room temperature by radiofrequency magnetron sputtering. Measuring the drain current (IDS) as a function of drain voltage (VDS) at different gate voltages (VGS) shows the TFTs possess hard saturation with on-currents of about 0.2 mA (see Figure) and saturation mobilities of 20 cm2 V-1 s-1. The optical and electrical properties and the compatibility of the fabrication process with low-cost plastic substrates show promise for invisible and flexible electronic circuits.

Identificador

http://hdl.handle.net/10362/3254

Idioma(s)

eng

Publicador

Wiley-VCH Verlag GmbH & Co.

Direitos

restrictedAccess

Palavras-Chave #Field-effect transistors #Zinc oxide
Tipo

article