Fully transparent ZnO thin-film transistor produced at room temperature
Data(s) |
18/03/2010
18/03/2010
01/03/2005
|
---|---|
Resumo |
Advanced Materials, Vol. 17, nº 5 Fully transparent thin-film transistors (TFTs) are produced at room temperature by radiofrequency magnetron sputtering. Measuring the drain current (IDS) as a function of drain voltage (VDS) at different gate voltages (VGS) shows the TFTs possess hard saturation with on-currents of about 0.2 mA (see Figure) and saturation mobilities of 20 cm2 V-1 s-1. The optical and electrical properties and the compatibility of the fabrication process with low-cost plastic substrates show promise for invisible and flexible electronic circuits. |
Identificador | |
Idioma(s) |
eng |
Publicador |
Wiley-VCH Verlag GmbH & Co. |
Direitos |
restrictedAccess |
Palavras-Chave | #Field-effect transistors #Zinc oxide |
Tipo |
article |