Study of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperatures


Autoria(s): Meng, Lijian; Teixeira, Vasco; Santos, M. P.
Data(s)

06/01/2014

06/01/2014

2013

Resumo

ZnO films doped with vanadium (ZnO:V) have been prepared by dc reactive magnetron sputtering technique at different substrate temperatures (RT–500 C). The effects of the substrate temperature on ZnO:V films properties have been studied. XRD measurements show that only ZnO polycrystalline structure has been obtained, no V2O5 or VO2 crystal phase can be observed. It has been found that the film prepared at low substrate temperature has a preferred orientation along the (002) direction. As the substrate temperature is increased, the (002) peak intensity decreases. When the substrate temperature reaches the 500 C, the film shows a random orientation. SEM measurements show a clear formation of the nano-grains in the sample surface when the substrate temperature is higher than 400 C. The optical properties of the films have been studied by measuring the specular transmittance. The refractive index has been calculated by fitting the transmittance spectra using OJL model combined with harmonic oscillator.

Identificador

http://dx.doi.org/10.1166/jnn.2013.6053

1533-4880

http://hdl.handle.net/10400.22/3227

Idioma(s)

eng

Publicador

American Scientific Publishers

Relação

Journal of Nanoscience and Nanotechnology; Vol. 13, Issue 2

http://www.ingentaconnect.com/content/asp/jnn/2013/00000013/00000002/art00138?token=004611e1d5a666f3a7b6c2a4038425e6b66477e3f2a49264f655d375c6b68763050210

Direitos

closedAccess

Palavras-Chave #Zinc Oxide #Vanadium Oxide #Thin Films #Sputtering #Optical Properties
Tipo

article