a-SiH p-i-n structures with extreme i-layer thickness


Autoria(s): Fantoni, Alessandro; Fernandes, Miguel; Vieira, Maria Manuela Almeida Carvalho; Casteleiro, C.; Schwarz, R.
Data(s)

28/11/2013

28/11/2013

01/10/2009

Resumo

We present measurements and numerical simulation of a-Si:H p-i-n detectors with a wide range of intrinsic layer thickness between 2 and 10 pm. Such a large active layer thickness is required in applications like elementary particle detectors or X-ray detectors. For large thickness and depending on the applied bias, we observe a sharp peak in the spectral response in the red region near 700 nm. Simulation results obtained with the program ASCA are in agreement with the measurement and permit the explanation of the experimental data. In thick samples holes recombine or are trapped before reaching the contacts, and the conduction mechanism is fully electron dominated. As a consequence, the peak position in the spectral response is located near the optical band gap of the a-Si:H i-layer. (C) 2009 Elsevier B.V. All rights reserved.

http://ac.els-cdn.com/S0040609009003393/1-s2.0-S0040609009003393-main.pdf?_tid=1048124c-577b-11e3-bf9f-00000aab0f27&acdnat=1385567361_28bd7b0c0165dd29d894b963fd4cbd15

Identificador

FANTONI, A.; FERNANDES, M.; VIEIRA, M.; CASTELEIRO, C.; SCHWARZ, R. - a-SiH p-i-n structures with extreme i-layer thickness. Thin Solid Films. ISSN 0040-6090. Vol. 517, nr. 23 (2009), p. 6426-6429.

0040-6090

10.1016/j.tsf.2009.02.073

http://hdl.handle.net/10400.21/2966

Idioma(s)

eng

Publicador

Elsevier Science SA

Direitos

restrictedAccess

Palavras-Chave #Amorphous materials #Sensors #Electrical properties and measurements #Photoconductivity #Numerical simulation #Devices #Simulation #Detectors
Tipo

conferenceObject