Micropatterning of single-walled carbon nanotube forest


Autoria(s): MOUSINHO, A. P.; Mansano, Ronaldo Domingues
Contribuinte(s)

UNIVERSIDADE DE SÃO PAULO

Data(s)

18/10/2012

18/10/2012

2011

Resumo

In this work, high-aligned single-walled carbon nanotube (SWCNT) forest have been grown using a high-density plasma chemical vapor deposition technique (at room temperature) and patterned into micro-structures by photolithographic techniques, that are commonly used for silicon integrated circuit fabrication. The SWCNTs were obtained using pure methane plasma and iron as precursor material (seed). For the growth carbon SWCNT forest the process pressure was 15 mTorr, the RF power was 250W and the total time of the deposition process was 3 h. The micropatterning processes of the SWCNT forest included conventional photolithography and magnetron sputtering for growing an iron layer (precursor material). In this situation, the iron layer is patterned and high-aligned SWCNTs are grown in the where iron is present, and DLC is formed in the regions where the iron precursor is not present. The results can be proven by Scanning Electronic Microscopy and Raman Spectroscopy. Thus, it is possible to fabricate SWCNT forest-based electronic and optoelectronic devices. (C) 2010 Elsevier B.V. All rights reserved.

Identificador

PROGRESS IN ORGANIC COATINGS, v.70, n.4, Special Issue, p.326-329, 2011

0300-9440

http://producao.usp.br/handle/BDPI/18607

10.1016/j.porgcoat.2010.11.014

http://dx.doi.org/10.1016/j.porgcoat.2010.11.014

Idioma(s)

eng

Publicador

ELSEVIER SCIENCE SA

Relação

Progress in Organic Coatings

Direitos

restrictedAccess

Copyright ELSEVIER SCIENCE SA

Palavras-Chave #Carbon nanotubes #Nanostructure films #Thin films #CVD processes #Raman Spectroscopy #Chemistry, Applied #Materials Science, Coatings & Films
Tipo

article

proceedings paper

publishedVersion