Micropatterning of single-walled carbon nanotube forest
Contribuinte(s) |
UNIVERSIDADE DE SÃO PAULO |
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Data(s) |
18/10/2012
18/10/2012
2011
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Resumo |
In this work, high-aligned single-walled carbon nanotube (SWCNT) forest have been grown using a high-density plasma chemical vapor deposition technique (at room temperature) and patterned into micro-structures by photolithographic techniques, that are commonly used for silicon integrated circuit fabrication. The SWCNTs were obtained using pure methane plasma and iron as precursor material (seed). For the growth carbon SWCNT forest the process pressure was 15 mTorr, the RF power was 250W and the total time of the deposition process was 3 h. The micropatterning processes of the SWCNT forest included conventional photolithography and magnetron sputtering for growing an iron layer (precursor material). In this situation, the iron layer is patterned and high-aligned SWCNTs are grown in the where iron is present, and DLC is formed in the regions where the iron precursor is not present. The results can be proven by Scanning Electronic Microscopy and Raman Spectroscopy. Thus, it is possible to fabricate SWCNT forest-based electronic and optoelectronic devices. (C) 2010 Elsevier B.V. All rights reserved. |
Identificador |
PROGRESS IN ORGANIC COATINGS, v.70, n.4, Special Issue, p.326-329, 2011 0300-9440 http://producao.usp.br/handle/BDPI/18607 10.1016/j.porgcoat.2010.11.014 |
Idioma(s) |
eng |
Publicador |
ELSEVIER SCIENCE SA |
Relação |
Progress in Organic Coatings |
Direitos |
restrictedAccess Copyright ELSEVIER SCIENCE SA |
Palavras-Chave | #Carbon nanotubes #Nanostructure films #Thin films #CVD processes #Raman Spectroscopy #Chemistry, Applied #Materials Science, Coatings & Films |
Tipo |
article proceedings paper publishedVersion |