Hardness and structure characterization of Ti(6)Al(4)V films produced by reactive magnetron sputtering on a conventional austenitic stainless steel
| Contribuinte(s) |
UNIVERSIDADE DE SÃO PAULO |
|---|---|
| Data(s) |
18/10/2012
18/10/2012
2008
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| Resumo |
Ti(6)Al(4)V thin films were grown by magnetron sputtering on a conventional austenitic stainless steel. Five deposition conditions varying both the deposition chamber pressure and the plasma power were studied. Highly textured thin films were obtained, their crystallite size (C) 2008 Elsevier Ltd. All rights reserved. |
| Identificador |
MICROELECTRONICS JOURNAL, v.39, n.11, Special Issue, p.1329-1330, 2008 0026-2692 http://producao.usp.br/handle/BDPI/18461 10.1016/j.mejo.2008.01.047 |
| Idioma(s) |
eng |
| Publicador |
ELSEVIER SCI LTD |
| Relação |
Microelectronics Journal |
| Direitos |
restrictedAccess Copyright ELSEVIER SCI LTD |
| Palavras-Chave | #Titanium alloys #Magnetron sputtering #Engineering, Electrical & Electronic #Nanoscience & Nanotechnology |
| Tipo |
article original article publishedVersion |
