Layout and material gradation in topology optimization of functionally graded structures: a global-local approach


Autoria(s): ALMEIDA, Sylvia R. M.; PAULINO, Glaucio H.; SILVA, Emilio C. N.
Contribuinte(s)

UNIVERSIDADE DE SÃO PAULO

Data(s)

18/10/2012

18/10/2012

2010

Resumo

By means of continuous topology optimization, this paper discusses the influence of material gradation and layout in the overall stiffness behavior of functionally graded structures. The formulation is associated to symmetry and pattern repetition constraints, including material gradation effects at both global and local levels. For instance, constraints associated with pattern repetition are applied by considering material gradation either on the global structure or locally over the specific pattern. By means of pattern repetition, we recover previous results in the literature which were obtained using homogenization and optimization of cellular materials.

Brazilian agency CAPES[3516/06-7]

FAPESP[2008/51070-0]

Brazilian agencies FAPESP[06/57805-7]

CNPq[303689/2009-9]

Identificador

STRUCTURAL AND MULTIDISCIPLINARY OPTIMIZATION, v.42, n.6, p.855-868, 2010

1615-147X

http://producao.usp.br/handle/BDPI/18318

10.1007/s00158-010-0514-x

http://dx.doi.org/10.1007/s00158-010-0514-x

Idioma(s)

eng

Publicador

SPRINGER

Relação

Structural and Multidisciplinary Optimization

Direitos

restrictedAccess

Copyright SPRINGER

Palavras-Chave #Topology optimization #Functionally graded materials #Functionally graded structures #Material layout #Material gradation #Symmetry and pattern repetition constraints #NONHOMOGENEOUS MATERIALS #FINITE-ELEMENTS #LENGTH SCALE #DESIGN #SHAPE #ACTUATORS #FILTERS #SCHEME #Computer Science, Interdisciplinary Applications #Engineering, Multidisciplinary #Mechanics
Tipo

article

original article

publishedVersion