Conducting polymer formed by low energy gold ion implantation


Autoria(s): Salvadori, Maria Cecilia Barbosa da Silveira; Cattani, Mauro Sergio Dorsa; Teixeira, Fernanda de Sá; BROWN, I. G.
Contribuinte(s)

UNIVERSIDADE DE SÃO PAULO

Data(s)

18/04/2012

18/04/2012

2008

Resumo

A buried conducting layer of metal/polymer nanocomposite was formed by very low energy gold ion implantation into polymethylmethacrylate. The conducting layer is similar to 3 nm deep and of width similar to 1 nm. In situ resistivity measurements were performed as the implantation proceeded, and the conductivity thus obtained as a function of buried gold concentration. The measured conductivity obeys the behavior well established for composites in the percolation regime. The critical concentration, below which the polymer remains an insulator, is attained at a dose similar to 1.0 x 10(16) atoms/cm(2) of implanted gold ions. (C) 2008 American Institute of Physics.

Fundacao de Amparo a Pesquisa do Estado de Sao Paulo (FAPESP)

Conselho Nacional de Desenvolvimento Cientifico e Tecnologico (CNPq), Brazil

Identificador

APPLIED PHYSICS LETTERS, v.93, n.7, 2008

0003-6951

http://producao.usp.br/handle/BDPI/15973

10.1063/1.2973161

http://dx.doi.org/10.1063/1.2973161

Idioma(s)

eng

Publicador

AMER INST PHYSICS

Relação

Applied Physics Letters

Direitos

openAccess

Copyright AMER INST PHYSICS

Palavras-Chave #ELECTRON-BEAM LITHOGRAPHY #OPTICAL-PROPERTIES #PERCOLATION PHENOMENA #PRECISE DETERMINATION #NANOPARTICLES #DEPOSITION #CLUSTERS #EXPONENT #FIELD #NM #Physics, Applied
Tipo

article

original article

publishedVersion