Characterization of thiol-functionalised silica films deposited on electrode surfaces
Contribuinte(s) |
UNIVERSIDADE DE SÃO PAULO |
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Data(s) |
26/03/2012
26/03/2012
2008
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Resumo |
Thiol-functionalised silica films were deposited on various electrode surfaces (gold, platinum, glassy carbon) by spin-coating sol-gel mixtures in the presence of a surfactant template. Film formation occurred by evaporation induced self-assembly (EISA) involving the hydrolysis and (co)condensation of silane and organosilane precursors on the electrode surface. The characterization of such material was performed by IR spectroscopy, thermogravimetry (TG), elemental analysis (EA), atomic force microscopy (AFM), scanning electron microscopy (SEM) and cyclic voltammetry (CV). Coordenacao de Aperfeicoamento de Pessoal de Nivel Superior (CAPES) FAPESP |
Identificador |
Materials Research, v.11, n.4, p.465-469, 2008 1516-1439 http://producao.usp.br/handle/BDPI/12212 10.1590/S1516-14392008000400015 http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392008000400015 |
Idioma(s) |
eng |
Publicador |
ABM, ABC, ABPol |
Relação |
Materials Research |
Direitos |
openAccess Copyright ABM, ABC, ABPol |
Palavras-Chave | #Silica films #3-mercaptopropyltrimethoxysilane #Evaporation induced self-assembly |
Tipo |
article original article publishedVersion |