Comparison of NMF and Kernel NMF in applications to OES plasma etching datasets


Autoria(s): Ragnoli, Emanuele; McLoone, Seán; Ringwood, John; MacGearailt, N.
Data(s)

2008

Identificador

http://pure.qub.ac.uk/portal/en/publications/comparison-of-nmf-and-kernel-nmf-in-applications-to-oes-plasma-etching-datasets(e1000bcd-f2dc-4d94-8d49-2209b9601fbd).html

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Ragnoli , E , McLoone , S , Ringwood , J & MacGearailt , N 2008 , ' Comparison of NMF and Kernel NMF in applications to OES plasma etching datasets ' Intel European Research and Innovation Conference , Leixlip , Ireland , 10/09/2008 - 12/09/2008 , pp. 77 .

Tipo

conferenceObject