A Dynamic Sampling Methodology for Plasma Etch Processes


Autoria(s): Honari, Bahman; McLoone, Seán
Data(s)

2012

Identificador

http://pure.qub.ac.uk/portal/en/publications/a-dynamic-sampling-methodology-for-plasma-etch-processes(95278756-cde0-43b5-a1e9-0d2cdc621bdd).html

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Honari , B & McLoone , S 2012 , ' A Dynamic Sampling Methodology for Plasma Etch Processes ' The European Advanced Process Control and Manufacturing (APCM) Conference , Grenoble , France , 16/04/2012 - 19/04/2012 , .

Tipo

conferenceObject