Barrier characteristics of PtSi/p-Si schottky diodes as determined from I-V-T measurements


Autoria(s): McCafferty, PG; Sellai, A; Dawson, P; Elabd, H
Data(s)

01/04/1996

Resumo

<p>The current-voltage-temperature characteristics of PtSi/p-Si Schottky barrier diodes were measured in the temperature range 60-115 K. Deviation of the ideality factor from unity below 80 K may be modelled using the so-called T-0 parameter with T-0 = 18 K. It is also shown that the curvature in the Richardson plots may be remedied by using the flatband rather than the zero-bias saturation current density. Physically, the departure from ideality is interpreted in terms of an inhomogeneous Schottky contact. Here we determine a mean barrier height at T = 0 K, phi(b)(-0) = 223 mV, with an (assumed) Gaussian distribution of standard deviation sigma(phi) = 12.5 mV. These data are correlated with the zero-bias barrier height, phi(j)(0) = 192 mV (at T = 90 K), the photoresponse barrier height, phi(ph) = 205 mV, and the flatband barrier height, phi(fb) = 214 mV. Finally, the temperature coefficient of the flatband barrier was found to be -0.121 mV K-1, which is approximately equal to 1/2(dE(g)(i)/dT), thus suggesting that the Fermi level at the interface is pinned to the middle of the band gap.</p>

Identificador

http://pure.qub.ac.uk/portal/en/publications/barrier-characteristics-of-ptsipsi-schottky-diodes-as-determined-from-ivt-measurements(af82946a-1f36-4f0b-8c6f-8447d0a16a0c).html

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

McCafferty , P G , Sellai , A , Dawson , P & Elabd , H 1996 , ' Barrier characteristics of PtSi/p-Si schottky diodes as determined from I-V-T measurements ' Solid State Electronics , vol 39 , no. 4 , pp. 583-592 .

Palavras-Chave #SILICIDE-SILICON INTERFACES #TEMPERATURE-DEPENDENCE #N-TYPE #HEIGHT #INHOMOGENEITIES #CONTACTS #MECHANISMS #ANOMALIES #STATES
Tipo

article