Monte Carlo calculations of quantum yield in inhomogeneous PtSi/p-Si Schottky barriers
Data(s) |
01/07/1998
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Resumo |
<p>Monte Carlo calculations of quantum yield in PtSi/p-Si infrared detectors are carried out taking into account the presence of a spatially distributed barrier potential. In the 1-4 mu m wavelength range it is found that the spatial inhomogeneity of the barrier has no significant effect on the overall device photoresponse. However, above lambda = 4.0 mu m and particularly as the cut-off wavelength (lambda approximate to 5.5 mu m) is approached, these calculations reveal a difference between the homogeneous and inhomogeneous barrier photoresponse which becomes increasingly significant and exceeds 50% at lambda = 5.3 mu m. It is, in fact, the inhomogeneous barrier which displays an increased photoyield, a feature that is confirmed by approximate analytical calculations assuming a symmetric Gaussian spatial distribution of the barrier. Furthermore, the importance of the silicide layer thickness in optimizing device efficiency is underlined as a trade-off between maximizing light absorption in the silicide layer and optimizing the internal yield. The results presented here address important features which determine the photoyield of PtSi/Si Schottky diodes at energies below the Si absorption edge and just above the Schottky barrier height in particular.</p> |
Identificador | |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/restrictedAccess |
Fonte |
Sellai , A & Dawson , P 1998 , ' Monte Carlo calculations of quantum yield in inhomogeneous PtSi/p-Si Schottky barriers ' Semiconductor Science and Technology , vol 13 , no. 7 , pp. 700-704 . |
Palavras-Chave | #I-V-T #SURFACE-PLASMONS #DIODES #ENHANCEMENT #SILICIDE #CONTACTS |
Tipo |
article |