Tracking plasma etch process variations using Principal Component Analysis of OES data
Data(s) |
2007
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Identificador | |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/restrictedAccess |
Fonte |
Ma , B , McLoone , S & Ringwood , J 2007 , ' Tracking plasma etch process variations using Principal Component Analysis of OES data ' Paper presented at International Conference on Informatics in Control, Automation and Robotics (ICINCO 2007) , Angers , France , 09/05/2007 - 12/05/2007 , . |
Tipo |
conferenceObject |