Identifying key process characteristics and predicting Etch Rate from High Dimensionality Datasets

Autoria(s): Ragnoli, E.; McLoone, Seán; Lynn, S.; Ringwood, J.; MacGearailt, N.
Data(s)

2009
Identificador

http://pure.qub.ac.uk/portal/en/publications/identifying-key-process-characteristics-and-predicting-etch-rate-from-high-dimensionality-datasets(7db9c202-6823-48a0-ae41-536045a98a99).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Ragnoli , E , McLoone , S , Lynn , S , Ringwood , J & MacGearailt , N 2009 , ' Identifying key process characteristics and predicting Etch Rate from High Dimensionality Datasets ' Paper presented at IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) , Berlin , Germany , 01/05/2009 - 01/05/2009 , .
Tipo

conferenceObject
Acesso ao item digital