Virtual metrology for plasma etch using tool variables


Autoria(s): Lynn, S.; Ringwood, J.; MacGearailt, N.; Ragnoli, E.; McLoone, Seán
Data(s)

2009

Identificador

http://pure.qub.ac.uk/portal/en/publications/virtual-metrology-for-plasma-etch-using-tool-variables(ae604c7d-4a47-42dd-a1d6-26d6bfdbf75b).html

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Lynn , S , Ringwood , J , MacGearailt , N , Ragnoli , E & McLoone , S 2009 , ' Virtual metrology for plasma etch using tool variables ' Paper presented at IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) , Berlin , Germany , 01/05/2009 - 01/05/2009 , .

Tipo

conferenceObject