Virtual metrology for plasma etch using tool variables
Data(s) |
2009
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Identificador | |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/restrictedAccess |
Fonte |
Lynn , S , Ringwood , J , MacGearailt , N , Ragnoli , E & McLoone , S 2009 , ' Virtual metrology for plasma etch using tool variables ' Paper presented at IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) , Berlin , Germany , 01/05/2009 - 01/05/2009 , . |
Tipo |
conferenceObject |