Plasma Etch Process Virtual Metrology using Aggregative Linear Regression

Autoria(s): Prakash, P. K S; McLoone, Seán
Data(s)

2011
Identificador

http://pure.qub.ac.uk/portal/en/publications/plasma-etch-process-virtual-metrology-using-aggregative-linear-regression(01d8e493-f796-4a9b-b90c-c6625415e99a).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Prakash , P K S & McLoone , S 2011 , ' Plasma Etch Process Virtual Metrology using Aggregative Linear Regression ' Paper presented at Third International Conference of Soft Computing and Pattern Recognition (SocPaR 2011) , Dalian , China , 14/10/2011 - 16/10/2011 , .
Tipo

conferenceObject
Acesso ao item digital