Estimation and Control in Semiconductor Etch: Practice and Possibilities

Autoria(s): Ringwood, John; Bacelli, Giorgio; Lynn, Shane; Ma, Beibei; Ragnoli, Emanuele; McLoone, Sean
Data(s)

2010
Identificador

http://pure.qub.ac.uk/portal/en/publications/estimation-and-control-in-semiconductor-etch-practice-and-possibilities(27872e93-02e4-4c98-8153-4685e15a0c39).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Ringwood , J , Bacelli , G , Lynn , S , Ma , B , Ragnoli , E & McLoone , S 2010 , ' Estimation and Control in Semiconductor Etch: Practice and Possibilities ' IEEE Transactions on Semiconductor Manufacturing , vol 23 , no. 1 , pp. 87-97 .
Tipo

article
Acesso ao item digital