Nanotribology at high temperatures

Autoria(s): Goel, Saurav; Stukowski, Alexander; Goel, Gaurav; Luo, Xichun; Reuben, Robert L
Data(s)

2012
Identificador

http://pure.qub.ac.uk/portal/en/publications/nanotribology-at-high-temperatures(4f088117-21f8-438e-9c3a-5729ebea3f96).html

http://dx.doi.org/10.3762/bjnano.3.68
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Goel , S , Stukowski , A , Goel , G , Luo , X & Reuben , R L 2012 , ' Nanotribology at high temperatures ' Beilstein Journal of Nanotechnology , vol 3 , no. 1 , pp. 586-588 . DOI: 10.3762/bjnano.3.68
Palavras-Chave #/dk/atira/pure/subjectarea/asjc/2500 #Materials Science(all) #/dk/atira/pure/subjectarea/asjc/2200/2208 #Electrical and Electronic Engineering #/dk/atira/pure/subjectarea/asjc/3100 #Physics and Astronomy(all)
Tipo

article
Acesso ao item digital