Novel TiO2 CVD films for semiconductor photocatalysis
| Data(s) |
23/08/2002
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|---|---|
| Resumo |
A novel CVD film of titanium(IV) oxide has been prepared on glass, via the reaction of titanium(IV) chloride and ethyl acetate, using a CVD technique. The film is clear, very robust mechanically and comprised of a thin (24 nm) layer of nanocrystalline anatase titania that absorbs light of lambda |
| Identificador | |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Mills , A , Elliott , N , Parkin , I P , O'Neill , S A & Clark , R J H 2002 , ' Novel TiO2 CVD films for semiconductor photocatalysis ' Journal of Photochemistry and Photobiology A: Chemistry , vol 151 , no. 1-3 , pp. 171-179 . |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/1500/1502 #Bioengineering #/dk/atira/pure/subjectarea/asjc/1600/1606 #Physical and Theoretical Chemistry |
| Tipo |
article |
