Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate
| Data(s) |
14/01/2003
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| Resumo |
Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to |
| Identificador | |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
O'Neill , S A , Clark , R J H , Parkin , I P , Elliott , N & Mills , A 2003 , ' Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate ' Chemistry of Materials , vol 15 , no. 1 , pp. 46-50 . DOI: 10.1021/cm020707f |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/2500 #Materials Science(all) #/dk/atira/pure/subjectarea/asjc/2500/2505 #Materials Chemistry |
| Tipo |
article |
