Atmospheric Pressure Chemical Vapour Deposition of thin Films of Nb2O5 on Glass


Autoria(s): O'Neill, S.A.; Parkin, I.P.; Clark, R.J.H.; Mills, Andrew; Elliott, N.
Data(s)

01/12/2003

Resumo

A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.

Identificador

http://pure.qub.ac.uk/portal/en/publications/atmospheric-pressure-chemical-vapour-deposition-of-thin-films-of-nb2o5-on-glass(9b2615ac-0122-41ba-8313-2fd8620d67d4).html

http://dx.doi.org/10.1039/b307768n

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

O'Neill , S A , Parkin , I P , Clark , R J H , Mills , A & Elliott , N 2003 , ' Atmospheric Pressure Chemical Vapour Deposition of thin Films of Nb2O5 on Glass ' Journal of Materials Chemistry , vol 13 , no. 12 , pp. 2952-2956 . DOI: 10.1039/b307768n

Palavras-Chave #/dk/atira/pure/subjectarea/asjc/1600/1606 #Physical and Theoretical Chemistry #/dk/atira/pure/subjectarea/asjc/2500/2505 #Materials Chemistry #/dk/atira/pure/subjectarea/asjc/2500 #Materials Science(all)
Tipo

article