Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing

Autoria(s): Tsvetkova, Tanya; Takahashi, Satoshi; Zayats, Anatoly; Dawson, Paul; Turner, R.; Bischoff, L.; Angelov, O.; Dimova-Malinovska, D.
Data(s)

01/06/2005
Identificador

http://pure.qub.ac.uk/portal/en/publications/fabrication-of-nanoscale-optical-patterns-in-amorphous-silicon-carbide-with-focused-ion-beam-writing(0abaa40f-97e7-4c8e-8e8f-e636e8eabd6b).html

http://dx.doi.org/10.1016/j.vacuum.2005.02.001
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Tsvetkova , T , Takahashi , S , Zayats , A , Dawson , P , Turner , R , Bischoff , L , Angelov , O & Dimova-Malinovska , D 2005 , ' Fabrication of nano-scale optical patterns in amorphous silicon carbide with focused ion beam writing ' Paper presented at 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004) , Kazimierz Dolny , Poland , 01/06/2005 - 01/06/2005 , pp. 100-105 . DOI: 10.1016/j.vacuum.2005.02.001
Tipo

conferenceObject
Acesso ao item digital