Near-field optical mapping of the ion-implanted patterns fabricated in amorphous silicon carbide

Autoria(s): Tsvetkova, Tanya; Takahashi, Satoshi; Zayats, Anatoly; Dawson, Paul; Turner, R.; Bischoff, L.; Angelov, O.; Dimova-Malinovska, D.
Data(s)

01/06/2005
Identificador

http://pure.qub.ac.uk/portal/en/publications/nearfield-optical-mapping-of-the-ionimplanted-patterns-fabricated-in-amorphous-silicon-carbide(f00f8989-b0ea-4d3c-ab5b-61f22749cd01).html

http://dx.doi.org/10.1016/j.vacuum.2005.02.002
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Tsvetkova , T , Takahashi , S , Zayats , A , Dawson , P , Turner , R , Bischoff , L , Angelov , O & Dimova-Malinovska , D 2005 , ' Near-field optical mapping of the ion-implanted patterns fabricated in amorphous silicon carbide ' Paper presented at 5th International Conference on Ion Implantation and Other Applications of Ions and Electrons (ION2004) , Kazimierz Dolny , Poland , 01/06/2005 - 01/06/2005 , pp. 94-99 . DOI: 10.1016/j.vacuum.2005.02.002
Tipo

conferenceObject
Acesso ao item digital